Scanning Electron and Near-field Microwave Microscope for sub-micrometer multimodal investigations

26. Juni 2017, 16:15 , 17:45

Veranstalter:  Olaf C. Hänßler, Universität Oldenburg & Universität Lille I
Ort:  A1-3-330

Abstract:
Research on “More Moore” and “beyond CMOS” requires tools to investigate, manipulate and transport
materials and objects in the sub-micrometer range. Introducing multiple imaging modalities to characterize
nanoscale features by hybrid microscopy and multi-probing heads of scanning probe instruments to acquire
manifold information at the same time is explicit needed by research and industry.
Performing accurate analysis of surface topography by using both Atomic Force Microscopy (AFM) and
Scanning Electron Microscopy (SEM) is common practice. The recently introduced near-field Scanning Mi-
crowave Microscopy (SMM) is able to image and characterize electrical parameters at the nanoscale with
evanescent microwaves.
Combining all these modalities in one hybrid instrument has many advantages. First, measuring multiple
parameters of the sample-under-test and second, proving the probe integrity in-situ without changing the
working environment. Localizing, navigating, live observation of the landing and scanning process of the
probe with the large field of view of an SEM and the help of microrobotic control algorithms allows for faster
sub-micrometer studies and opens the door to automation.
This work targets on the design and evaluation of a hybrid multimodal microscope that combines diverse
analysis techniques to obtain multiple parameter of nanoscale objects at the same spot and time with robotic
strategies.
The developed vacuum-tight interferometer-based AFM performs imaging of the object topography, while
the designed SMM records electromagnetic properties in the microwave range. The whole setup is operating
inside the vacuum chamber of a Scanning Electron Microscope (SEM) under high vacuum. This setup is
controlled by a software framework tailored for vison-based nanorobotics. The, so-called, Scanning Electron
and Microwave Microscope (SEM2) allows for simultaneously observing the region-of-interest with the res-
olution of an SEM while imaging and characterizing with evanescent microwaves.
The design and evaluation of a new test standard for all used microscope modalities is introduced. To validate
the approach an analysis of micro-fabricated Metal-Oxide-Semiconductor (MOS) capacitors arrays is in-
cluded.
Betreuer: Prof. Dr.-Ing. Sergej Fatikow